Date of Award
9-19-2016
Document Type
Thesis
Degree Name
Engineering, MSE
First Advisor
Ilwoo Seok
Committee Members
Brandon Kemp; Shivan Haran
Call Number
LD 251 .A566t 2016 A42
Abstract
Most of the researches in developing arrayed patterns have utilized the lithography process with pre-patterned structures. However, lithography itself is considerably low efficient in terms of cost and time, especially by the chemical etching process. Furthermore, the chemical etching process is also a potential barrier in three dimensional structures with multi-layered patterns. The limitation of substrate and mask size is also disadvantageous to the larger area in real-time fabrication process. In this study, a new approach using the solid thin-film dewetting process with intense pulsed light annealing and optical study towards wavelength transformation is introduced to overcome the addressed problems. Application of intense pulsed light on the metal thin film generates nanoparticles, which responses to the surface plasmon resonance in the visible wavelength. UV/VIS Spectrometer is used to check the transmission spectrum of the formed nanoparticles. Scanning Electron Microscope (SEM) images reveal the surface morphology of the fabricated nanoparticles. The photolithography process allows transferring the desired pattern on silicon substrate through the sacrificial resist. Finally, lift-off process is done to remove the resist to set the preferred metal on top of the pattern.
Rights Management
This work is licensed under a Creative Commons Attribution 4.0 International License.
Recommended Citation
Al-Hossain, Aktaruzzaman, "Fabrication of Nano Patterned Arrays and Optical Applications" (2016). Student Theses and Dissertations. 655.
https://arch.astate.edu/all-etd/655
